公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2013 | Physical properties of an oxide photoresist film for submicron pattern lithography | Chiang, D.; Chang, C.-M.; Chen, S.-W.; Yang, C.-T.; Hsueh, W.-J.; WEN-JENG HSUEH | Thin Solid Films | 3 | 3 | |
2006 | A quadratic goal programming model and sensitivity analysis for semiconductor supply chain | Chiang, D.; Guo, R.-S.; Chen, A.; ARGON CHEN ; MING-HUANG CHIANG ; RUEY-SHAN GUO | IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings | 0 | 0 | |
2013 | Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithography | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Yang, C.-T.; Huang, M.-J.; Cheng, C.-T.; Hsueh, W.-J.; WEN-JENG HSUEH | Applied Mechanics and Materials | 1 | 0 | |
2013 | Submicron-size patterning on the sapphire substrate prepared by nanosphere lithography and nanoimprint lithography techniques | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Yang, C.-T.; Huang, M.-J.; Hsueh, W.-J.; WEN-JENG HSUEH | Metals and Materials International | 6 | 6 | |
2013 | Surface property study of different patterning sapphire structures by ICP-RIE | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Huang, M.-J.; Yang, C.-T.; Hsueh, W.-J.; WEN-JENG HSUEH | 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems | 0 | 0 | |