Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2021 | Investigation on helium ion beam lithography with proximity effect correction | Lee C.-L; Chien S.-W; Tsai K.-Y; Liu C.-H.; KUEN-YU TSAI | Journal of Micro/Nanopatterning, Materials and Metrology | 1 | 1 |