公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2007 | Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas | Hsu, C. C.; Titus, M. J.; Graves, D. B.; JERRY CHENG-CHE HSU | Journal of Vacuum Science & Technology A | 20 |