公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2005 | Design of Collaborative Engineering Data System (CEDS): an application case of process integration | Fan, Chih-Min; Chang, Shi-Chung; Chang, Henry | Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on | 0 | 0 | |
1997 | EWMA/SD: an end-of-line SPC scheme to monitor sequence-disordered data [semiconductor manufacturing] | Fan, Chih-Min; Guo, Ruey-Shan ; Chang, Shi-Chung | 1997 2nd International Workshop on Statistical Metrology | 0 | 0 | |
2003 | Integrated yield-mining solution with enhanced electrical test data correlation | Fan, Chih-Min; Guo, Ruey-Shan ; Chen, Argon ; Hon, Amos; Wei, John; King, Mingchu | The Ninth International Symposium on Semiconductor Manufacturing, 2003 | 0 | 0 | |
2000 | SHEWMA: an End-of-line SPC Scheme Using Wafer Acceptance Test Data | Fan, Chih-Min; Guo, Ruey-Shan ; Chang, Shi-Chung; SHI-CHUNG CHANG | IEEE Transactions on Semiconductor Manufacturing | 16 | 13 | |
1999 | SHEWMAC: an end-of-line SPC scheme for joint monitoring of process mean and variance | Fan, Chih-Min; SHI-CHUNG CHANG ; RUEY-SHAN GUO ; Kung, Hui-Hung; You, Jyh-Cheng; Chen, Hsin-Pai; Lin, Steven; Wei, John | Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on | 2 | 0 | |