公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2016 | Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process | Liu, Iou-Jen; Fang, Shao-Yun; Chang, Yao-Wen; YAO-WEN CHANG | Ieee Transactions on Computer-Aided Design of Integrated Circuits and Systems | 6 | 5 | |
2013 | Simultaneous OPC- and CMP-aware routing based on accurate closed-form modeling. | Fang, Shao-Yun; Lin, Chung-Wei; Liao, Guang-Wan; YAO-WEN CHANG ; CHUNG-WEI LIN | International Symposium on Physical Design, ISPD'13, Stateline, NV, USA, March 24-27, 2013 | 4 | 0 |