公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
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2016 | Enhancement of gate-bias and current stress stability of P-type SnO thin-film transistors with SiNx/HfO2 passivation layers | Hsu S.-M.; Li Y.-S.; Tu M.-S.; He J.-C.; Chiu I.-C.; Chen P.-G.; Lee M.-H.; Chen J.-Z.; JIAN-ZHANG CHEN ; I-CHUN CHENG | 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials | 1 | 0 |