公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
1998 | Application of anodization followed by rapid thermal treatment to thin gate oxide growth | Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU | Journal of the Chinese Institute of Electrical Engineering, Transactions of the Chinese Institute of Engineers, Series E/Chung KuoTien Chi Kung Chieng Hsueh K'an | | | |
1988 | C-V hysteresis instability in aluminum/tantalum oxide/silicon oxide/silicon capacitors due to postmetallization annealing and Co-60 irradiation | Hwu, Jenn-Gwo; Jeng, Ming-Jer; JENN-GWO HWU | Journal of the Electrochemical Society | 11 | 13 | |
1998 | Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation | Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU | Proceedings of the National Science Council, Republic of China, Part A: Physical Science and Engineering | | | |