公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2006 | A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography | Ni Hu; Arthur Tay; Kuen-Yu Tsai; KUEN-YU TSAI | Measurement Science and Technology | 5 | 2 | |
2007 | Real-time spatial control of photoresist development rate | Arthur Tay; Weng-Khuen Ho; Ni Hu; Choon-Meng Kiew; Kuen-Yu Tsai; KUEN-YU TSAI | Proc. SPIE , Metrology, Inspection, and Process Control for Microlithography | 0 | 0 | |
2006 | Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography | Arthur Tay; Weng-Khuen Ho; Ni Hu; Kuen-Yu Tsai; Ying Zhou; KUEN-YU TSAI | Proc. SPIE, Data Analysis and Modeling for Process Control II | 0 | 0 |