公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
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2013 | Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. the effect of oxygen addition | Hsu C.-C. ; Marchack N.; Martin R.M.; Pham C.; Hoang J.; Chang J.P. | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 5 | 4 |