公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2013 | Dual layer photoresist complimentary lithography applied on sapphire substrate for producing submicron patterns | Chang, C.-M.; Chiang, D.; Shiao, M.-H.; Yang, C.-T.; Huang, M.-J.; Cheng, C.-T.; WEN-JENG HSUEH | Microsystem Technologies | 1 | 1 | |
2014 | The effect of inductively-coupled-plasma reactive ion etching power on the etching rate and the surface roughness of a sapphire substrate | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Yang, C.-T.; Cheng, C.-T.; Hsueh, W.-J.; WEN-JENG HSUEH | Journal of Nanoscience and Nanotechnology | | | |
2012 | The sub-micron hole array in sapphire produced by inductively-coupled plasma reactive ion etching | Shiao, M.-H.; Chang, C.-M.; Huang, S.-W.; Lee, C.-T.; Wu, T.-C.; Hsueh, W.-J.; Ma, K.-J.; WEN-JENG HSUEH ; Hsueh, Wen-Jeng | Journal of Nanoscience and Nanotechnology | 4 | 5 | |
2013 | Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithography | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Yang, C.-T.; Huang, M.-J.; Cheng, C.-T.; Hsueh, W.-J.; WEN-JENG HSUEH | Applied Mechanics and Materials | | | |
2013 | Submicron-size patterning on the sapphire substrate prepared by nanosphere lithography and nanoimprint lithography techniques | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Yang, C.-T.; Huang, M.-J.; Hsueh, W.-J.; WEN-JENG HSUEH | Metals and Materials International | | | |
2013 | Surface property study of different patterning sapphire structures by ICP-RIE | Chang, C.-M.; Shiao, M.-H.; Chiang, D.; Huang, M.-J.; Yang, C.-T.; Hsueh, W.-J.; WEN-JENG HSUEH | 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems | | | |