公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2012 | Direct-scatterometry-enabled lithography model calibration | Chen, C.-Y.; Tsai, K.-Y.; Shen, Y.-T.; Lee, Y.-M.; Li, J.-H.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 3 | 0 | |
2013 | Direct-scatterometry-enabled optical-proximity-correction-model calibration | Chen, C.-Y.; Ng, P.C.W.; Liu, C.-H.; Shen, Y.-T.; Tsai, K.-Y.; Li, J.-H.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Proceedings of SPIE - The International Society for Optical Engineering | 1 | 0 | |
2014 | Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises | Lee, Y.-M.; Li, J.-H.; Wang, F.-M.; Cheng, H.-H.; Shen, Y.-T.; Tsai, K.-Y.; Shieh, J.J.; KUEN-YU TSAI ; JIA-HAN LI | Journal of Optics (United Kingdom) | 0 | 0 | |