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Results 1-13 of 13 (Search time: 0.189 seconds).

Issue DateTitleAuthor(s)SourcescopusWOSFulltext/Archive link
12001A novel illuminator design in a rapid thermal processorLee, M.H.; Liu, C.W.; CHEE-WEE LIU IEEE Transactions on Semiconductor Manufacturing 60
21991Control System for VLSI FabricationRUEY-SHAN GUO; RUEY-SHAN GUO IEEE Transactions on Semiconductor Manufacturing 00
31996Daily scheduling for R&D semiconductor fabricationLiao, Da-Yin; Chang, Shi-Chung ; Pei, Kuo-Wei; Chang, Chi-MingIEEE Transactions on Semiconductor Manufacturing 5239
42013Errutum: Multifunction thermopile sensors fabricated with a MEMS-compatible process (IEEE Transactions on Semiconductor Manufacturing 2013) 26:2 (242-247))Sin, L.-M.; Pan, T.-T.; Tsai, C.-W.; Chou, C.-F.; Hong, J.-Q.; Tsai, J.-C.; JUI-CHE TSAI IEEE Transactions on Semiconductor Manufacturing 00
52010Forward echelon-based inventory monitoring in a semiconductor supply ChainGuo, R.-S. ; Chiang, M.-H.; Lin, H.-W.; Chen, J.-Y.IEEE Transactions on Semiconductor Manufacturing 11
62001Improvement in oxide thickness uniformity by repeated spike oxidationHong, C.-C.; Lee, C.-Y.; Hsieh, Y.-L.; Liu, C.-C.; Fong, I.-K.; Hwu, J.-G.; JENN-GWO HWU IEEE Transactions on Semiconductor Manufacturing 44
72002Improvement in ultrathin rapid thermal oxide uniformity by the control of gas flowHong, C.-C.; Yen, Y.-R.; Su, J.-L.; Hwu, J.-G.; JENN-GWO HWU IEEE Transactions on Semiconductor Manufacturing 33
81993Modeling, Optimization and Control of Spatial Uniformity in Manufacturing ProcessesRUEY-SHAN GUO; E. Sachs; RUEY-SHAN GUO IEEE Transactions on Semiconductor Manufacturing 3326
92013Multi-function thermopile sensors fabricated with a MEMS-compatible processSin, L.-M.; Pan, T.-T.; Tsai, C.-W.; Chou, C.-F.; Hong, J.-Q.; Tsai, J.-C.; JUI-CHE TSAI IEEE Transactions on Semiconductor Manufacturing 53
101991Process Control System for VLSI FabricationSachs, E.; Guo, R.-S. ; Ha, S.; Hu, A.IEEE Transactions on Semiconductor Manufacturing 8564
112006Temperature and substrate effects in monolithic RF inductors on silicon with 6-μm-thick top metal for RFIC applicationsChiu, H.-W.; Lin, Y.-S.; Liu, K.; Lu, S.-S.; SHEY-SHI LU IEEE Transactions on Semiconductor Manufacturing 33
121999The effect of patterned susceptor on the thickness uniformity of rapid thermal oxidesLee, K.-C.; Chang, H.-Y.; Chang, H.; Hwu, J.-G.; Wung, T.-S.; JENN-GWO HWU IEEE Transactions on Semiconductor Manufacturing 1210
132015Wafer map failure pattern recognition and similarity ranking for large-scale data setsWu, M.-J.; Jang, J.-S.R.; Chen, J.-L.; JYH-SHING JANG IEEE Transactions on Semiconductor Manufacturing 139113