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Issue DateTitleAuthor(s)SourcescopusWOSFulltext/Archive link
12010Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain methodYen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 22
22009Electromechanical behavior of the curled cantilever beamWEN-PIN SHIH ; Lin, Quei Yen; Chuang, Wan-Chun; Tsai, Yi-Lin; Hu, Yuh-Chung; Lee, Chi-Yuan; Liu, Ming-Che; Shih, Wen-Pin ; Lin, Wei-Cheng; Chang, Pei-Zen ; Hsueh, Po-Ren; Liaw, Shwu-Jen; ���Q�s; ���դ�Journal of Micro/Nanolithography, MEMS, and MOEMS 1013
32010Fabrication and testing of surface ratchets primed with hydrophobic parylene and hexamethyldisilazane for transporting dropletsChung Y.-C.; Hess G.-Y.; Yeh F.-W.; Han H.-C.; Chen C.-Y.; Lee C.-J.; Sheen H.-J ; Yang L.-J.Journal of Micro/Nanolithography, MEMS, and MOEMS 54
42011Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effectsPhilip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 1919
52012New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraintsHoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 03
62012New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithographyChun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 04
72011Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effectsPhilip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 44
82009Vertical electrothermal actuator with separated metal and nitride structural layersTsai, J.-C.; Lai, R.-J.; Yin, C.-Y.; Chen, D.-S.; Shen, C.-K.; Chang, Y.-T.; JUI-CHE TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 32
92013Void-based photonic crystal mirror with high-reflectivity and low-dissipation for extreme-ultraviolet radiationYen-Min Lee; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI Journal of Micro/Nanolithography, MEMS, and MOEMS 00