次32奈米半間距微影製程考慮多重曝光之光罩設計自動化研究

Project title

次32奈米半間距微影製程考慮多重曝光之光罩設計自動化研究

Internal ID

98-2221-E-002-118-MY3

Principal Investigator

Start Date

August 1, 2009

End Date

July 31, 2010

Partner Organizations

National Science and Technology Council