Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
.National Taiwan University / 國立臺灣大學
Project / 研究計畫
後矽電子之增強技術-子計畫一:碳化矽上新穎絕緣層技術
後矽電子之增強技術-子計畫一:碳化矽上新穎絕緣層技術
Details
Primary Data
Project title
後矽電子之增強技術-子計畫一:碳化矽上新穎絕緣層技術
Internal ID
97-2221-E-002-231-MY3
Principal Investigator
JENN-GWO HWU
Start Date
August 1, 2010
End Date
July 31, 2011
Partner Organizations
National Science and Technology Council