以波帶片陣列為基礎之極紫外光直寫微影系統之研發-子計畫五：極紫外光直寫微影系統之伺服控制

Project title

Internal ID

98-2221-E-002-167-MY3

Principal Investigator

Start Date

August 1, 2009

End Date

July 31, 2010

Partner Organizations

Keywords

極紫外光微影

擾動響應分解

強韌控

系統精

密定位

Extreme Ultra-Violet Lithography (EUVL)

Disturbance Response Decoupling (DRD)

robust control

system precision positioning