2奈米及以下製程世代水平與垂直全繞閘極式CMOS元件之次波長極紫外光微影成像度增進及非理想幾何元件建模技術

Project title

2奈米及以下製程世代水平與垂直全繞閘極式CMOS元件之次波長極紫外光微影成像度增進及非理想幾何元件建模技術

Internal ID

109-2221-E-002-179-

Principal Investigator

Start Date

August 1, 2020

End Date

July 31, 2021

Partner Organizations

National Science and Technology Council