Use of Si O 2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch

Journal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Journal Volume

24

Journal Issue

2

Pages

599-603

Date Issued

2006

Author(s)

Liang, E.-Z.

Huang, C.-J.

DOI

URI

Type

journal article