Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping

Resource

ACS Applied Materials & Interfaces, 4(7), 3471-3475

Journal

ACS Applied Materials & Interfaces

Pages

3471-3475

Date Issued

2012

Date

2012

Author(s)

Chien, Jui-Fen

Chen, Ching-Hsiang

Shyue, Jing-Jong

DOI

URI

Type

journal article

File(s)

Name

09.pdf

Size

23.38 KB

Format

Adobe PDF

Checksum

(MD5):854cc05a1659db5e2d6f42c5640b4de0