On-Wafer Characterization of Thermomechanical Properties for Isotropic Thin Films Deposited on Anisotropic Substrates
Resource
Japanese Journal of Applied Physics,47(7),5623-5629.
Journal
Japanese Journal of Applied Physics
Journal Volume
47
Journal Issue
7
Pages
5623-5629
Date Issued
2008-07
Date
2008-07
Author(s)
Wu, Liang-Chieh
Chou, Yuan-Fang
Type
journal article
