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College of Engineering / 工學院
Mechanical Engineering / 機械工程學系
Interfacial reactions of rf-sputtered TiNi thin films on(100) silicon with a SiN diffusion barrier
Details
Interfacial reactions of rf-sputtered TiNi thin films on(100) silicon with a SiN diffusion barrier
Journal
Philosophical Magazine
Journal Volume
Vol 84
Pages
1209-1218
Date Issued
2004
Author(s)
S. K.Wu*
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/415662
Type
journal article
