Fabrication and Measurement of Large-Area Subwavelength Structures with Broadband and Wide-Angle Antireflection Effect
Journal
Microelectronic Engineering
Journal Volume
87
Pages
1323-1327
Date Issued
2010-08
Author(s)
Yung-Pin Chen
Hsin-Chieh Chiu
Guan-Yu Chen
Chieh-Hsiu Chiang
Ching-Tung Tseng
Chih-Hsien Lee
Lon A. Wang
Abstract
In this paper, large-area two-dimensional sub-wavelength structures (SWS) on Si substrates are fabricated by combining interference lithography and reactive ion etching. The average reflectance of the SWS samples is less than 2.87% with broadband operation from 250 to 1200 nm. It also shows good uniformity over the whole patterned area by measuring 16 divided SWS areas. The reflectance variations with different incident angles are measured by our varied-angle reflectometer and the reflectance is lower than 5% for the incident angles smaller than 50° over the broadband region. © 2009 Elsevier B.V. All rights reserved.
Type
journal article