Fabrication of Nano Graphite Thin Film by Electron Beam Lithography
Date Issued
2007
Date
2007
Author(s)
Lin, Yung-Hsu
DOI
en-US
Abstract
Monolayer graphite thin film (graphene) has attracted much attention recently because of its many unique properties and potential applications. In this thesis, we describe the method we developed to fabricate graphene-based device. Mechanical proliferation was used to create thin graphite fakes on the surface of SiO2 which was grown on top of n+ silicon substrate. Optical and Atomic force microscope were then used to identify the position and thickness of the graphene flakes. Electron beam lithography was then employed to make contacts to these graphene flakes. The problems that were encountered and solved in these processes will be are presented and discussed in this thesis.
Subjects
電子束
石墨
薄膜
Electron Beam Lithography
Graphite
Type
thesis
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