Layer transfer of crystalline Si thin film by metal-assisted chemical etching concerning different H2O2/HF ratios
Journal
IEEE Photovoltaic Specialists Conference
Pages
346-349
Date Issued
2012
Author(s)
Abstract
Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H2O2/HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm2) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV. © 2012 IEEE.
Subjects
crystalline materials; etching; nanostructuredmaterials; optical reflection; photovoltaic cells; silicon; thin film devices
SDGs
Other Subjects
Chemical solutions; Crystalline Si; Crystalline thin films; Layer transfer; Low costs; Manufacturing methods; Material utilization; Metal-assisted chemical etching; Nanoholes; Optical reflectance; Optical reflection; Photovoltaic; Efficiency; Etching; Nanostructured materials; Photovoltaic cells; Silicon; Thin film devices; Thin films; Crystalline materials
Type
conference paper