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College of Science / 理學院
Applied Physics / 應用物理研究所
Interface reactions of high-k Y2O3 gate oxides with Si
Details
Interface reactions of high-k Y2O3 gate oxides with Si
Journal
Applied Physics Letters
Journal Volume
79
Journal Issue
15
Pages
2447-2449
Date Issued
2001
Author(s)
Busch, BW
Kwo, J
MINGHWEI HONG
Mannaerts, JP
Sapjeta, BJ
Schulte, WH
Garfunkel, E
Gustafsson, T
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/293165
Type
journal article