Electron Beam Lithography Technology and Application on the Mesas to Assist Germanium Quantum-Dots Growth
Date Issued
2004
Date
2004
Author(s)
Chen, Yan-Ju
DOI
en-US
Abstract
In all fields of technology, nano-technology is today’s buzzword. The applications of the nanometer-order technology are needed, for example, in IC processing, optoelectronic devices, DNA researching, and micro machining. Nano-technology can be roughly divided into non-semiconductor-based field and semiconductor-based field. Because semiconductor-based technology has the advantage of process integration, mass and uniform production can be achieved.
Electron beam lithography system plays an important role in nano-technology. It is capable of exposing nano-patterns that photolithography fail to do. In this thesis, we will mainly introduce the ELS-7500EX, an electron beam lithography system provided by ELIONIX, and exploit it to delimit nano-patterns, such as lines and circles. In addition, the study of using electron beam lithography system (EBLS), reactive ion etching (RIE) and ultra high vacuum chemical vapor deposition (UHV-CVD) to form Ge quantum dots on silicon mesas is discussed.
Subjects
奈米
電子束
e-beam
nanometer
Type
thesis
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