Alignment control of liquid crystals using conductive atomic force microscopy nanolithography
Journal
Japanese Journal of Applied Physics
Journal Volume
47
Journal Issue
6 PART 1
Pages
4583-4585
Date Issued
2008
Author(s)
Lin, T.-C.
Abstract
Conductive atomic force microscopy (CAFM) nanolithography was used to modify a silicon surface. This approach generating the silicon oxide grating by CAFM gives a control of liquid crystal (LC) alignment in the micron or submicron region. It establishes a pixel with a smaller size to achieve high-resolution images. Compared with the conventional cloth rubbing and AFM scratching techniques, the CAFM nanolithography prevents scratching damage, dust contamination and residual static electricity problems. Furthermore, this inorganic alignment method can also avoid the damage caused by UV light exposure and high-temperature environment.
Type
journal article