An effective SPC approach to monitoring semiconductor quality data with multiple variation sources
Resource
Semiconductor Manufacturing Technology Workshop, 2000
Journal
Semiconductor Manufacturing Technology Workshop
Pages
-
Date Issued
2000-06
Date
2000-06
Author(s)
DOI
N/A
Abstract
In semiconductor manufacturing, post-process metrology and statistical monitoring of quality data are critical to ensure a high yield and good quality products. Effective SPC charting can detect process excursions and provide early warning on possible process faults. Therefore, it is important to design SPC charts such that process shifts, small or large, can be detected early and accurately, while the number of false alarms can be cut down to an acceptable level.
SDGs
Type
journal article
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