Formation mechanism dependence on laser power of UV-laser ablated silicon surface gratings
Resource
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Journal
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Pages
-
Date Issued
1999-09
Date
1999-09
Author(s)
Chen, Cheng-Yen
Gurtler, Steffen
Yang, C.C.
DOI
N/A
Abstract
We report our results of UV-laser ablated Si surface gratings. It was found that different laser-matter interactions were involved in forming the surface gratings when different levels of laser power were used. Hence, different morphologies of gratings were observed. In fabricating a grating, a silicon wafer was exposed to the interference fringes formed through a prism or a holographic system with the fourth-harmonic (266 nm) of a Q-switched Nd:YAG laser.
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Type
journal article
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