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  5. Effects of interfacial layers in InGaNGaN quantum-well structures on their optical and nanostructural properties
 
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Effects of interfacial layers in InGaNGaN quantum-well structures on their optical and nanostructural properties

Journal
Journal of Applied Physics
Journal Volume
98
Journal Issue
1
Date Issued
2005
Author(s)
Cheng Y.-C.
Wu C.-M.
Yang C.C.
Li G.A.
Rosenauer A.
Ma K.-J.
Shi S.-C.
CHIH-CHUNG YANG  
LI-CHYONG CHEN  
DOI
10.1063/1.1978988
URI
https://www.scopus.com/inward/record.uri?eid=2-s2.0-22944450354&doi=10.1063%2f1.1978988&partnerID=40&md5=c487f4b277e252b40f8a6997946ced49
https://scholars.lib.ntu.edu.tw/handle/123456789/616393
Abstract
We compared the optical properties and material nanostructures between several InGaNGaN multiple quantum-well (QW) samples of different interfacial layers. In some of the samples, InN interfacial layers were inserted between the wells and barriers to improve the QW quality and hence the light-emission efficiency. Compared with a widely used barrier-doped QW structure, the insertions of the InN interfacial layers (silicon doped or undoped) do enhance the photon emission efficiencies. Of the two samples with InN interfacial layers, the one with intrinsic InN interfacial layers had the higher photoluminescence (PL) and electroluminescence (EL) efficiencies. Cluster structures are clearly observed in this sample, resulting in strong carrier localization. In this sample, we also observed a temperature-dependent S-shape variation in the PL spectral peak, a strong photoluminescence excitation (PLE) intensity, and a steep PL decay time variation beyond its peak as a function of temperature. On the other hand, both carrier localization and quantum-confined Stark effect (QCSE) were relatively weaker in another sample, which includes silicon-doped InN interfacial layers. The broadening of the InGaN well layers, in one sample, by inserting silicon-doped InGaN interfacial layers led to the sharpest cluster structures and the strongest carrier localization among the four samples. Therefore, in this sample we observed quite high PL and EL efficiencies, increasing EL spectral peak energy with temperature, a strong PLE intensity, and a steep PL decay time variation beyond its peak in temperature dependence. Compared with the aforementioned samples, the widely used QW structure (the reference sample) shows the lowest PL and EL emission efficiencies, the smallest PL and EL emission photon energies, and the generally longest PL decay times. This suggests that the QCSE is the strongest in this sample. © 2005 American Institute of Physics.
SDGs

[SDGs]SDG7

Other Subjects
Carrier localization;Cluster structure;Photoluminescence excitation (PLE);Quantum-confined Stark effects (QCSE);Doping (additives);Gallium nitride;Light emission;Nanostructured materials;Photoluminescence;Photons;Semiconducting indium compounds;Semiconducting silicon;Semiconductor quantum wells
Type
journal article

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