UV/H2O2光催化程序對於控制消毒副產物前驅物質的影響
The effects of UV/H2O2 process on controlling DBPs precursors
Date Issued
2007
Date
2007
Author(s)
Fang, Li-Ting
DOI
zh-TW
Abstract
Chlorination is a common disinfection process in Taiwan with the advantages of efficient microorganism control, low cost and fast. However, it also generates toxic disinfection by-products because of the reaction between organic matter and chlorine. The best way to reduce the formation of THM is removing the organic precursors, and advanced oxidation processes has been shown to be effective to remove the organic precursors. The objective of this study is to evaluate the effects of UV/H2O2 process on DBPs precursors’ removal.
Four organic precursors were selected in this study to evaluate the effect of different structures and functional groups on THM formation. The variation of THM formation and changes on precursors’ functional groups by UV/H2O2 process was also evaluated.
At lower chlorine doses (10 and 20 mg/L), the total THM formation decrease with increasing DOC concentrations and no Br-THM species was observed when resorcinol and phloroglucinol were tested. When higher chlorine dosage (100 mg/L) is applied, Br-THM species is obtained and the total THM formation increased dramatically. It is inferred that resorcinol and phloroglucinol have higher steric hindrance which block the reaction of bromine, and higher chlorine dosage provides oxidative force to change the structure of resorcinol and phloroglucinol and thus promote Br-THM and higher THM formation.
When the organic precursors were treated with UV/H2O2 process, the THMFP of three aromatic precursors decreased with photolysis time. However, the highest THMFP for aliphatic 1,7-heptanediol was observed after 10 minutes of UV photolysis. The FTIR spectrum revealed that peaks of hydroxyl, hydrocarbon and carboxylic structures were observed after UV photolysis. This provided some information to demonstrate the change of the functional groups during the photolysis and the oxidation efficacy of UV/H2O2 process for organic precursors.
Subjects
有機前質
三鹵甲烷
紫外光
過氧化氫
precursors
THM
AOPs
UV
H2O2
Type
thesis
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