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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering
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Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering
Journal
Applied Surface Science
Journal Volume
508
Date Issued
2020
Author(s)
Chen, S.-C.
Kuo, T.-Y.
Lin, H.-C.
Chen, R.-Z.
Sun, H.
HSIN-CHIH LIN
DOI
10.1016/j.apsusc.2019.145106
URI
https://www.scopus.com/inward/record.url?eid=2-s2.0-85077507454&partnerID=40&md5=9f63bf53544a097f39a934834210c6b3
https://scholars.lib.ntu.edu.tw/handle/123456789/546675
Type
journal article
