Vapor-assisted micropatterning in replica structures: A solventless approach towards topologically and chemically designable surfaces

Abstract

A solventless method for fabricating chemically and topologicaly designable surfaces based on chemical vapor deposition (CVD) polymerization through soft lithographic stencils or replica structures was reported. Surface features were defined by the deposition polymer footprints and the subsequent CVD polymerization resulted in localized islands of ultra-thin polymer films. The results show that the thickness of polymer elements can be controlled by the amount of starting material used for CVD polymerization. The elastomeric replica structure when brought in contact with substrate surface shows that the vapor-based monomers enter the replica structures and polymerize on vacant surface areas. An excellent adhesion between reactive coating and substrate is seen that is not affected by exposure to standard solvents.