Development of Rolling Micro-Embossing Process
Date Issued
2005
Date
2005
Author(s)
shje, Jeng-Luen
DOI
zh-TW
Abstract
This thesis is devoted to the development of rolling micro-embossing process.Conventional rolling embossing can fast transform micro-structure on substrate, it is only limited to flexible substrate at present. In order to solve present shortcoming and restriction, one innovative method of rolling micro-embossing process was developed. The process is a carried out by applying a constant force over the roller stamp, forcing it to contact the resin-coated glass substrate and applying UV light from bottom of substrate. Three different kinds of pattern have been transferred completely on the photoresist :(i) 30×80μm dimension、40μm deep grating structure(ii)100μm diameter、21μm deep microlens array and (iii) 58μm wide、6μm deep micro U-groove features.
Non-uniform pressure distribution is a problem when only nickel mould is wrapping around the 56mm diameter,160mm long steel roller. The nickel mold size is 40×40 mm and 150μm thick. By wrapping cushion pad around steel roller before attaching the nickel mold to uniform imprinting pressure throughout the whole area can be achieved. In order to reduce the sticking problem between the resist and mold, the mold was pretreated with a mold release agent Teflon.
In this study, it is found that the platform speed is the most important processing parameter since curing time is critical. The micro-structure can be replicated when platform speed is between 0.5~2.1mm/s. The embossing pressure should be above 1.2kgf/cm2 to achieve uniform pressure.
Subjects
滾輪
壓印
感光阻劑
PDMS
UV光
roller
embossing
resist
UV light
Type
thesis
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