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College of Engineering / 工學院
Mechanical Engineering / 機械工程學系
Crystallization behavior of r.f.-sputtered near stoichiometric Ni2MnGa thin films
Details
Crystallization behavior of r.f.-sputtered near stoichiometric Ni2MnGa thin films
Journal
Thin Solid Films
Journal Volume
408
Journal Issue
1-2
Pages
316-320
Date Issued
2002
Author(s)
Wu, S.K.
Tseng, K.H.
Wang, J.Y.
SHYI-KAAN WU
DOI
10.1016/S0040-6090(02)00134-7
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-0037012494&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/296859
Type
journal article