Creation of line defects in holographic photonic crystals by a double-exposure thresholding method
Resource
APPLIED OPTICS Vol. 44, No. 13 1 May 2005
Journal
APPLIED OPTICS Vol. 44
Journal Issue
No. 13 1 May 2005
Pages
-
Date Issued
2005-05-01
Date
2005-05-01
Author(s)
Chang, Chen
Yan, Tzu-Min
Liu, Hua-Kuang
DOI
246246/2006111501222108
Abstract
Recording of periodic variations of amplitude and phase by the interference of coherent laser beams in a
hologram offers a natural means for creating one-, two-, and three-dimensional photonic crystals. For
device applications such as waveguides in optical communications, one usually needs to create defects in
photonic crystals. We present an analysis and an experimental demonstration of a double-exposure
method for creating photonic crystals with line defects. The idea is based on the principle of superposition
of holographic grating patterns of different spatial periods while the recording medium is held stationary
and on the application of a threshold to the recording medium. We use the same symmetrical optical
architecture to achieve nondefective and defective holographic photonic crystals. The technique may be
extended to the creation of defects based on functional synthesis by means of Fourier series, by use of light
sources of other wavelengths with an appropriate high-contrast recording material. © 2005 Optical
Society of America
Publisher
Taipei:National Taiwan University Dept Elect Engn
Type
journal article
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