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College of Engineering / 工學院
Chemical Engineering / 化學工程學系
An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
Details
An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist
Journal
Reactive and Functional Polymers
Journal Volume
157
Date Issued
2020
Author(s)
Tseng, L.-Y.
Lin, Y.-C.
Kuo, C.-C.
Kuo, C.-C.
Ueda, M.
WEN-CHANG CHEN
DOI
10.1016/j.reactfunctpolym.2020.104760
URI
https://www.scopus.com/inward/record.url?eid=2-s2.0-85093653814&partnerID=40&md5=8fb276dfd72d2955ce975b4e0750fe7b
https://scholars.lib.ntu.edu.tw/handle/123456789/546517
Type
journal article