Novel fabrication of Si thin film for solar cell applications
Journal
2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014
Pages
1284-1286
Date Issued
2014
Author(s)
Abstract
We demonstrate a novel method to fabricate crystalline silicon thin film for solar cell applications. It can reduce material cost and energy consumption. Here, we adopt a multi-step metal-assisted chemical etching procedure by using silver as catalyst to form silicon thin film. Through engineering the etching direction, this method provides possibility to fabricate transferable silicon thin film. Moreover, the substrate can be reused for further thin film fabrication. © 2014 IEEE.
Subjects
anisotropic etching; crystalline silicon thin film; electro-less metal deposition; isotropic etching; metal-assisted chemical etching; multi-step metal-assisted chemical etching
SDGs
Other Subjects
Anisotropic etching; Deposition; Energy utilization; Fabrication; Metals; Nanocrystalline materials; Semiconductor materials; Silicon solar cells; Substrates; Thin film solar cells; Crystalline silicon thin films; Isotropic etching; Material cost; Metal deposition; Metal-assisted chemical etching; Silicon thin film; Solar-cell applications; Thin film fabrication; Thin films
Type
conference paper