Effect of tensile stress on mos capacitors with ultra-thin gate oxide

Journal

International Journal of Electrical Engineering

Journal Volume

16

Journal Issue

4

Pages

283-287

Date Issued

2009

Author(s)

Chen, H.-L.

Lee, C.-J.

Hwu, J.-G.

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-70349616711&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/347698

Type

journal article