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College of Science / 理學院
Physics / 物理學系
Time dependent preferential sputtering in the HfO2 layer on Si(100)
Details
Time dependent preferential sputtering in the HfO2 layer on Si(100)
Journal
Thin Solid Films
Journal Volume
516
Journal Issue
6
Pages
948-952
Date Issued
2008
Author(s)
Chang, S.J.
Lee, W.C.
Hwang, J.
MINGHWEI HONG
Kwo, J.
DOI
10.1016/j.tsf.2007.06.007
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/443429
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-37549038602&doi=10.1016%2fj.tsf.2007.06.007&partnerID=40&md5=862a1716a6ef41b0fa082bf6c022e726
Type
journal article