NANO-MACHINING TECHNIQUE ON QUARTZ AND ITS APPLICATION TO NANOIMPRINT LITHOGRAPHY

Quartz has the potential to be developed as a device due to its material properties
including piezoelectricity, isolation, transparency, high hardness and high thermal
stability. The major obstacle to MEMS and NEMS developing techniques on quartz
is the machining difficulty and the charging problem resulting from isolation in the
e-beam exposure process. This research utilizes the conducting polymer Espacer
300 as a conducting layer to dissipate the charging effect. After E-beam lithography,
the quartz mold is fabricated by metal evaporation, lift-off, and a reactive ion etch.
Afterwards, the surface of the quartz mold is treated by dodecyltrichlorosilane in toluene. Photo-solidification NIL is accomplished using the surface-treated mold and
photo cross-linked polymer mr-L 6000.3Xpe. This research has successfully defined
100nm-width resist features and 200nm-width metal mask. Features of 500nm are
resolved on the mode and transferred to the polymer after imprinting.
Keywords: Quartz,Mold, E-beamlithography, Nanoimprint, Photo-solidification NIL.