A high-duty ka-band extended interaction klystron
Journal
2008 IEEE International Vacuum Electronics Conference with 9th IEEE International Vacuum Electron Sources Conference
Pages
201-202
Date Issued
2008
Author(s)
Chiang, W.Y.
Abstract
A high-duty extended-interaction klystron (EIK) is built to power a high-Q cavity for materials processing. The EIK is comprised of a single-gap input cavity, 5 buncher cavities, and a 2-gap output cavity. The cavities can be stagger tuned for broad bandwidth. The gaps are made of CuNi alloy to increase the cavity loading for further bandwidth improvement. A compact neodymium-iron-boron permanent magnet system is employed for electron beam focusing. A depressed collector is employed for overall efficiency enhancement.
SDGs
Type
conference paper