Optical properties of InAs1-xNx/In0.53Ga0.47As single quantum wells grown by gas source molecular beam epitaxy
Journal
Journal of Electronic Materials
Journal Volume
32
Journal Issue
4
Pages
244-248
Date Issued
2003-04
Author(s)
Abstract
Optical properties of InAs1-xNx/In0.53Ga0.47As (hereafter, abbreviated as InAsN/InGaAs) single quantum wells (SQWs) grown on InP substrates by gas source molecular-beam epitaxy are studied using photoluminescence (PL) measurements. By comparing the low-temperature PL spectra of InAs/InGaAs and InAsN/InGaAs SQWs, InAs and InAsN phases are found to coexist in the InAsN layer. Such serious alloy inhomogeneities result in obvious exciton localization by potential irregularities. The blue shift of the PL peak after rapid thermal annealing (RTA) is found to originate mainly from As-N interdiffusion inside the well layer. According to the temperature-dependent PL results, uniformity of the InAsN layer can be effectively improved by RTA, and the exciton localization is, thus, relieved. Comparison of luminescence quenching and excitation-power-dependent PL behavior between the QWs with and without nitrogen content suggests that the quality of the QW is degraded by the introduction of nitrogen, and the degradation can only be partially recovered by post-growth RTA.
Type
journal article