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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure
Details
Directly patterning metal films by nanoimprint lithography with low-temperature and low-pressure
Journal
Microelectronic Engineering
Journal Volume
83
Journal Issue
4-9 SPEC. ISS.
Pages
893-896
Date Issued
2006
Author(s)
Chen, H.L.
Chuang, S.Y.
Cheng, H.C.
Lin, C.H.
Chu, T.C.
HSUEN-LI CHEN
DOI
10.1016/j.mee.2006.01.095
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/491351
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-33646051989&doi=10.1016%2fj.mee.2006.01.095&partnerID=40&md5=5ca875051b1e319eaebf2e654fb41201
Type
journal article