Electron-beam lithography assisted patterning of surfactant-templated mesoporous thin films
Journal
Nanotechnology
Journal Volume
15
Journal Issue
12
Pages
1886-1889
Date Issued
2004
Author(s)
Abstract
Here we report a novel approach to fabricating patterned three-dimensional (3D) mesoporous thin films by spin coating a surfactant-templated SiO2 or TiO2 precursor solution onto electron-beam (EB) lithographically prepared resist moulds. Subsequent mechanical polishing and calcination led to patterned SiO2 or TiO2 thin films with uniform mesopores and an amorphous or nanocrystalline framework. This approach provides a novel route for patterning mesoporous non-siliceous thin films as well as silica with feature sizes from hundreds of nanometres to sub-millimetres over areas of several square centimetres. This is of much interest for the miniaturization of devices and for potential applications from low-k materials to optoelectronic devices and biochemical sensors.
Type
journal article