Deposition of ZnS thin films by photochemical deposition technique
Resource
MATERIALS LETTERS 58(2003), 67-70
Journal
MATERIALS LETTERS 58(2003)
Pages
67-70
Date Issued
2003
Date
2003
Author(s)
Gunasekaran, M.
Gopalakrishnan, R.
Ramasamy, P.
DOI
246246/2006111501243960
Abstract
ZnS thin films have been deposited on a glass substrate by photochemical deposition (PCD) technique from an aqueous solution. The
effect of pH and stirring speed of the solution on deposition has been studied. The optical transmission spectra of the solutions have been
recorded before and after deposition and also for the deposited film. The as-deposited and annealed films were characterized by X-ray
diffraction (XRD) and it is observed that the crystallinity of the deposited films is improved by annealing at various temperature from 100 to
500 jC. The surface coverage of the film has been studied using optical microscope.
Subjects
Deposition
Photochemical Technology
Semiconductors
Thin films
ZnS
Surface morphology
SDGs
Publisher
Taipei:National Taiwan University Dept Chem Engn
Type
journal article
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