Fabrication of Broadband Antireflection Subwavelength Structures on Flat and Curved Substrates by Interference Lithography and Nanoimprint Technique
Date Issued
2007
Date
2007
Author(s)
Lee, Chao-Te
DOI
en-US
Abstract
In many theoretical and experimental studies, it has been proved that 2D subwavelength periodic structure contributes to the effect of broadband antireflection, in order to increase the light transmittance. We anticipated that this kind of structure will be widely used in solar cells, cell phone, etc. Even it could replace the traditional antireflection thin film coating. In this thesis, we will discuss the design and fabrication of the AR structure.
In order to control the reflectance spectrum and efficiency, we utilized rigorous coupled wave analysis (RCWA) to calculate the period, depth, and shape of the periodic structure precisely. From the simulation results we realized that, the high-aspect-ratio structure will contribute to better AR performance.
We utilize two beam interference lithography to fabricate AR structure on Si substrates. And by means of inductive couple plasma (ICP) etching, to fabricate the high aspect ratio, periodic, AR structure on into Si.
By means of nanoimprint technique, we replicated the AR structure on curved substrates. This technique contributes to the results of mass production, cost reduction.
In addition, traditional plate beamsplitter will results in ghost image in interference lithography degenerate the quality of exposed pattern. Therefore, according to the optical thin film theory, we designed the specific pellicle beamsplitter. The incident angle of the pellicle beamsplitter is around 40 degree and 50 degree, which will meet the expectation of our experimental process. We also tried to use it to improve our fabrication process.
Subjects
曲面抗反射結構
干涉微影
奈米壓印
Antireflection curved structure
interference lithography
nanoimprint
Type
thesis
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