Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch
Resource
The Journal of Vacuum Science and Technology B 24 (2): 599-603
J. Vac. Sci. Technol. B,24(2),599-603.
Journal
The Journal of Vacuum Science and Technology B
Journal Volume
Vacuum
Journal Issue
2
Pages
599-603
Date Issued
2006
Date
2006
Author(s)
Type
journal article
File(s)![Thumbnail Image]()
Loading...
Name
77.pdf
Size
417.54 KB
Format
Adobe PDF
Checksum
(MD5):f186b973229b673b1364251f8f19b963