Study of 2-D and 3-D Nanosphere Lithography for Optoelectronic Device and Sensor Applications
Date Issued
2007
Date
2007
Author(s)
Lin, Yu-Hsiang
DOI
zh-TW
Abstract
Nanosphere lithography (NSL) is a novel method for the fabrication of hexagonal close-packed structures by self-assembly monolayer nanosphere array on flat substrates. Here the monolayer nanospheres are taked as etching mask layer like patterned resists. Furthermore, the period and dimension can be controlled by the size of nanospheres. Because of cheap, rapid, and extensive applications, it’s one of the important nanofabrication techniques. In the fabrication of monolayer nanosphere array, we fabricate large-area monolayer nanospheres by spin coating method and using as etching mask for the fabrication of sub-wavelength pyramid anti-reflection structure on silicon substrate by wet etching and dry etching processes. And the reflectance of silicon substrates can be reduced to 3%. Besides, we fabricate periodical metal hole-arrays which have high surface plasma transmission by deposition and lift-off processes on monolayer nanospheres.
And in three-dimensional (3D) opal-like photonic crystal, we investigate the influence of different environments and nanospheres with different surface charge distribution on opal structures. Besides, we provide a rapid fabrication method of fabricating silica inverse opal structure. And we try to infiltrate gold nanoparticles (Au NPs) into inverse opal. It’s hard to catch Au NPs in 3D nano structure without aggregation, but we find the optimal parameter to fabricate inverse opal structure with adhered Au NPs uniformly. This photonic crystal have both photonic band gap(PBG) and localized surface plasma resonance (LSPR) effects, and the two properties in one structure can be used to probe the refractive index of infiltrated solution and the properties of bio-molecular which adhered on Au NPs. At last, we use drop coating method to add organic luminescence material on opal and find the luminescence wavelength at photonic band gap is confined by opal structures. When the detector angle is changed, the confined luminescence wavelength of opal which added organic luminescence material is also changed. Besides, the emission intensity can be enhanced by energy transfer of polystyrene and large surface area.
Subjects
奈米球微影術
Nanosphere Lithography
Type
thesis
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