Plasma-enhanced chemical-vapor deposition oxide prepared at low-flow conditions for course wavelength-division multiplexing optical-waveguide devices
Journal
Journal of Electronic Materials
Journal Volume
32
Journal Issue
6
Pages
492-495
Date Issued
2003
Author(s)
Chu, A. K.
Lin, J. Y.
Wang, M. L.
Fan, C. C.
Shue, H. S.
Chuang, T. H.
Chen, S. Y.
Chiu, C. H.
Lin, S. F.
Type
journal article